WebJul 15, 2002 · Flare (stray light) is an important effect impacting extreme ultraviolet lithography (EUVL) imaging system performance. Four flare measurement methods including Kirk, modulation transfer… Expand 4 Highly Influenced PDF View 4 excerpts, cites methods and background Extreme ultraviolet (EUV) lithography B. Rice Physics 2014 WebFlare caused by scattered light in the projection optics could result in several nanometers of on-wafer dimensional variation, if left uncorrected. Previous work by the authors has focused on combinations of model-based and rules-based approaches to modeling and correction of flare in EUV lithography.
DUV and VUV Microlithographic Objective Optical Designs
A fundamental aspect of EUVL tools, resulting from the use of reflective optics, is the off-axis illumination (at an angle of 6 degrees, in different direction at different positions within the illumination slit) on a multilayer mask. This leads to shadowing effects resulting in asymmetry in the diffraction pattern that degrade pattern fidelity in various ways as described below. For example, one side (be… ion tv 2021 holiday movies
Measuring and modeling flare in optical lithography
WebFeb 17, 2024 · Lithography is employed to fabricate complicated circuit patterns on a semiconductor substrate. In the pursuit of faster processing speeds and large-scale integration, the critical dimension (CD) of circuit patterns has become increasingly small. Webthe layout contribute to the flare,the vacancy density map Dv is used to approximate the intensity map, instead of the pattern density map, during computation of flaremap F [10] as WebJun 25, 2003 · Measuring and modeling flare in optical lithography. C. Mack. Published in SPIE Advanced Lithography 25 June 2003. Physics. Flare, unwanted scattered light … ion tv 2021 christmas movies